{"id":106,"date":"2025-04-16T12:26:00","date_gmt":"2025-04-16T15:26:00","guid":{"rendered":"http:\/\/www.mvpthemes.com\/zoxnews\/?p=106"},"modified":"2025-09-26T00:52:37","modified_gmt":"2025-09-26T03:52:37","slug":"nano-euv-chips-parte-i","status":"publish","type":"post","link":"https:\/\/convergencia.tech\/inicio\/nano-euv-chips-parte-i\/","title":{"rendered":"Nano- EUV – Chips Parte I"},"content":{"rendered":"
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<\/i>\u00a0<\/a><\/div>\n
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Convergencia.tech (Nano- EUV – Chips) Parte I<\/h3>\n

La litograf\u00eda ultravioleta extrema (tambi\u00e9n conocida como EUV, UVE, EUVL o LUVE) es una tecnolog\u00eda de litograf\u00eda que utiliza una gama de longitudes de onda ultravioleta extrema (UVE), que abarca aproximadamente un ancho de banda de 2 % FWHM de aproximadamente 13,5 nm.<\/p>\n

Si bien la tecnolog\u00eda UVE est\u00e1 disponible para la producci\u00f3n en masa, menos de cincuenta m\u00e1quinas en todo el mundo son capaces de producir obleas utilizando la t\u00e9cnica, en comparaci\u00f3n, a partir de 2013, m\u00e1s de 200 sistemas de inmersi\u00f3n en litograf\u00eda ultravioleta profunda (UVP o DUV por sus siglas en ingl\u00e9s) ya estaban implementados. A partir del tercer trimestre de 2019, 5,7 millones de obleas han sido expuestas en herramientas de producci\u00f3n de UVE; Se expusieron 1,7 millones de obleas solo en Q1-Q3,<\/p>\n

mientras que el n\u00famero de herramientas aument\u00f3 de 31 a 45 (del orden de 10 WPH por herramienta).<\/p>\n

Los problemas que dificultan la adopci\u00f3n de UVE son los costos de las herramientas<\/p>\n

(los esc\u00e1neres UVE de ASML pueden costar hasta US$120 millones).<\/p>\n

A partir de 2023, ASML Holding es la \u00fanica empresa que produce y vende sistemas UVE para la producci\u00f3n de chips, principalmente dirigidos a 5 nm. En el International Electron Devices Meeting (IEDM) de 2019,<\/p>\n

\"\"<\/p>\n

TSMC inform\u00f3 del uso de UVE para 5 nm en capas de contacto, v\u00edas, l\u00edneas met\u00e1licas y cortes, donde los cortes pueden aplicarse a aletas, puertas o l\u00edneas met\u00e1licas.<\/p>\n

A partir de septiembre de 2023, ASML es el \u00fanico fabricante de m\u00e1quinas de litograf\u00eda que utilizan luz ultravioleta extrema (EUV). Esta tecnolog\u00eda permite fabricar chips con transistores m\u00e1s peque\u00f1os y eficientes, lo que mejora el rendimiento y reduce el consumo de energ\u00eda.<\/p>\n

Los principales fabricantes de chips que utilizan EUV son:<\/p>\n

TSMC, Samsung Electronics, Intel, GlobalFoundries<\/p>\n

China est\u00e1 trabajando para desarrollar su propia tecnolog\u00eda EUV. En 2022, la empresa china SMIC anunci\u00f3 que hab\u00eda logrado fabricar chips de 14 nm utilizando una tecnolog\u00eda de litograf\u00eda no EUV.<\/p>\n

SMIC tambi\u00e9n est\u00e1 trabajando en el desarrollo de una tecnolog\u00eda EUV propia. Estos fabricantes utilizan EUV para producir chips de \u00faltima generaci\u00f3n, como los de 5 nm, 3 nm y 2 nm.<\/p>\n

Fuente: wikipedia<\/p>\n<\/div>\n","protected":false},"excerpt":{"rendered":"

Nano- EUV – Chips Parte I<\/p>\n","protected":false},"author":2,"featured_media":618,"comment_status":"open","ping_status":"open","sticky":false,"template":"","format":"video","meta":{"footnotes":""},"categories":[5],"tags":[],"class_list":["post-106","post","type-post","status-publish","format-video","has-post-thumbnail","hentry","category-nano","post_format-post-format-video"],"yoast_head":"\nNano- EUV - Chips Parte I - Convergencia.tech<\/title>\n<meta name=\"description\" content=\"Nano- EUV \u2013 Chips Parte I\" \/>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/convergencia.tech\/inicio\/nano-euv-chips-parte-i\/\" \/>\n<meta property=\"og:locale\" content=\"es_ES\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Nano- EUV - Chips Parte I - Convergencia.tech\" \/>\n<meta property=\"og:description\" content=\"Nano- EUV \u2013 Chips Parte I\" \/>\n<meta property=\"og:url\" content=\"https:\/\/convergencia.tech\/inicio\/nano-euv-chips-parte-i\/\" \/>\n<meta property=\"og:site_name\" content=\"Convergencia.tech\" \/>\n<meta property=\"article:published_time\" content=\"2025-04-16T15:26:00+00:00\" \/>\n<meta property=\"article:modified_time\" content=\"2025-09-26T03:52:37+00:00\" \/>\n<meta property=\"og:image\" content=\"https:\/\/convergencia.tech\/inicio\/wp-content\/uploads\/2017\/07\/nano006.png\" \/>\n\t<meta property=\"og:image:width\" content=\"609\" \/>\n\t<meta property=\"og:image:height\" content=\"268\" \/>\n\t<meta property=\"og:image:type\" content=\"image\/png\" \/>\n<meta name=\"author\" content=\"Claudio R Parrinello\" \/>\n<meta name=\"twitter:card\" content=\"summary_large_image\" \/>\n<meta name=\"twitter:label1\" content=\"Escrito por\" \/>\n\t<meta name=\"twitter:data1\" content=\"Claudio R Parrinello\" \/>\n\t<meta name=\"twitter:label2\" content=\"Tiempo de lectura\" \/>\n\t<meta name=\"twitter:data2\" content=\"3 minutos\" \/>\n<script type=\"application\/ld+json\" class=\"yoast-schema-graph\">{\"@context\":\"https:\/\/schema.org\",\"@graph\":[{\"@type\":\"WebPage\",\"@id\":\"https:\/\/convergencia.tech\/inicio\/nano-euv-chips-parte-i\/\",\"url\":\"https:\/\/convergencia.tech\/inicio\/nano-euv-chips-parte-i\/\",\"name\":\"Nano- EUV - 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